The novel EnviroMETROS series provides the perfect routine analysis tools for any sample with a special focus on multilayer thin films and their surfaces by combining small to large sample capabilities or wafer handling with a variable information depth photoelectron spectrometer.

KEY FEATURES

  • Metrology with ultimate stability, reliability and repeatability;
  • Precise chemical and dimensional quantification
  • Short acquisition times (high sensitivites and throughput)
  • Non-destructive depth profiling using different photon energies in combination with angle resolved XPS (ARXPS)
  • Flexible analysis area (100 µm to 1 mm)
  • Integration of supplementary optical metrology (IRRAS and Raman)
  • Electronic structure analysis by combined UPS and IPES
  • Identification of energy loss mechanisms by REELS
  • Option to operate the system in UHV or NAP environmentv
  • Fully Software Controlled

EnviroMETROS LAB enables hybrid metrology with high stability, reliability, and repeatability. It is designed for high sensitivites and throughput analysis and opens up new applications in the fields of ultrathin films and 2D materials, multilayer systems and their surfaces. The novel EnviroMETROS combines a variable information depth photoelectron spectrometer with optical and other analytical techniques to provide chemical and dimensional analysis of unsurpassed precision.

The EnviroMETROS LAB allows for the use of multiple or large samples (up to 80 x 80 mm), ISO conformity, clean room and SEMI standard compatibility.

It is versatile because it allows surface chemical analysis by XPS with adjustable information depth using X-ray energies of 1487 eV, 2984 eV, 5414 eV, as well as non-destructive depth profiling by parallel angle detection. It also includes sputter depth profiling using either monoatomic Ar-ions or Ar-clusters, ISS for top-most surface layer identification, electronic structure analysis by combined UPS and IPES, surface optical metrology by IRRAS and Raman, and identification of energy loss mechanisms by REELS. It is available
as ultra-high-vacuum (UHV) version with a base pressure of 10-10 mbar as well as environmental version with working pressures from UHV up to 50 mbar.
 
The system is completely integrated, characterized by a comfortable design concepted for easy installation and operation with a maintenance-friendly structure and optimized uptime.

Finally, it is optimized by the software package Keystone M, that allows easy, fast and computerized handling with user level control, automated operation, analysis and data evaluation. All the parameters are stored and documented enabling the possibility of reproducible analysis recipes and templates and easy user support.

Join us in the future of surface hybrid metrology and explore new applications every day.

SPECIFICATIONS

System

  • Automated surface metrology system for (NAP-)XPS, (NAP-)HAXPES, LEISS
  • Arn+-Sputter depth profiling, REELS, (NAP-)UPS, IPES, SEM/SAM, Raman and IRRAS
  • Clean room, CE, UL and SEMI compliant

System LAB

  • Integrated load lock, sample distribution and sample storage chamber with automated sample transfer
  • Connection from distribution chamber to other UHV or HV systems or sample introduction from a glovebox (optional)

Pumping System

  • Turbomolecular pumps
  • Oil-free backing pumps

Electron spectrometer

  • From UHV (< 5 × 10-10 mbar) to NAP (50 mbar)
  • Hemispherical Electron Analyzer (150 mm) with wide angle lens (+/- 30°)
  • AD-CMOS Detector (< 1200 energy channels and < 12 angle channels)

X-Ray Source

  • Small spot crystal monochromator
  • Spot sizes: < 100 μm to > 1 mm
  • Switchable X-ray energies (Al Kα, Ag Lα, Cr Kα)

Charge neutralisation

  • Dual beam charge neutralization (UHV)
  • Environmental charge compensation (NAP)

SEM/SAM

  • Imaging with 1 μm lateral resolution

Sputter depth profiling

  • Monoatomic (0.2 – 5 keV)
  • Ar-Cluster (up to 10 keV, optional)

LEISS

  • He+ ion scattering spectroscopy (0.2 – 5 keV)

(NAP-)UPS

  • Small spot UV discharge source

IPES

  • Low energy BIS (5 – 15 eV)

REELS

  • Electron energies (0.1 – 5 keV)

RAMAN/IRRAS

  • Integrated in measurement position

Gas dosing system

  • Automatic inlet for 3 gases (optional)

Automation

  • Full automation of vacuum system, sample transfer, data analysis, reporting

Software

  • Keystone M for vacuum control, sample transfer,
    sample analysis and reporting
  • ISQAR and ITFAP packages integrated for
    data evaluation and depth profiling

Sample holder size

  • 80 mm × 80 mm

Sample holders

  • Up to 4 electrical contacts on sample holder (more optional on request)

Sample stage

  • Fully motorized, non-magnetic, UHV/NAPcompatible and computer controlled three axis sample stage for full 80 mm × 80 mm lateral motion and 20 mm vertical motion

For more information, visit the SPECS page dedicated to the products in the Enviro family.